Haydary, Juma, <br/><br/>
Chemical process design and simulation :  Aspen Plus and Aspen Hysys applications / 
Juma Haydary. 
 - New Jersey  Wiley  2019 
 - xliv, 391 pages ;  29 cm 
<br/><br/>Includes bibliographical references and index. 
<br/><br/><label>ISBN: </label>9781119089117 1119089115 
<br/><br/><label>LCCN: </label>2018459815 
<br/><br/><label>Nat. Bib. No.: </label>GBB8N5093  bnb 
<br/><br/><label>Nat. Bib. Agency Control No.: </label>019173760  Uk 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Chemical processes.<br/>Chemical processes--Computer simulation.<br/>Chemical engineering.<br/>Chemical engineering--Computer simulation.<br/>Chemical engineering.<br/>Chemical processes.<br/>Chemical processes--Computer simulation.
<br/><br/><label>LC Class. No.: </label>TP155.7  / .H425 2019 
<br/><br/><label>Dewey Class. No.: </label>660.2812 HAY-J