000 02178cam a22003617i 4500
999 _c38766
_d38766
001 19258396
005 20190124191744.0
008 160901t20162016fluaf b 001 0 eng d
010 _a 2016448121
020 _a9781482228670
020 _a9781138749320
020 _a148222867X
035 _a(OCoLC)ocn934674803
040 _aYDXCP
_beng
_cYDXCP
_erda
_dBDX
_dCDX
_dOCLCQ
_dOCLCO
_dTKN
_dVGM
_dOCLCF
_dBTCTA
_dDLC
042 _alccopycat
050 0 0 _aTK7875
_b.N39 2016
082 0 4 _a621.38152 ODA-S
_223
100 _aOda, Shunri
245 0 0 _aNanoscale silicon devices /
_cedited by Shunri Oda, David K. Ferry.
260 _aLondon
_bCRC Press
_c2016
300 _axii, 288 pages, 8 unnumbered pages of plates :
_billustrations (some color) ;
_c24 cm
365 _aGBP
_b50.00
500 _aSmaller is better when it comes to the semiconductor transistor. Nanoscale Silicon Devices examines the growth of semiconductor device miniaturization and related advances in material, device, circuit, and system design, and highlights the use of device scaling within the semiconductor industry. Device scaling, the practice of continuously scaling down the size of metal-oxide-semiconductor field-effect transistors (MOSFETs), has significantly improved the performance of small computers, mobile phones, and similar devices. The practice has resulted in smaller delay time and higher device density in a chip without an increase in power consumption. This book covers recent advancements and considers the future prospects of nanoscale silicon (Si) devices. It provides an introduction to new concepts (including variability in scaled MOSFETs, thermal effects, spintronics-based nonvolatile computing systems, spin-based qubits, magnetoelectric devices, NEMS devices, tunnel FETs, dopant engineering, and single-electron transfer), new materials (such as high-k dielectrics and germanium), and new device structures in three dimensions. It covers the fundamentals of such devices, describes the physics and modeling of these devices, and advocates further device scaling and minimization of energy consumption in future large-scale integrated circuits (VLSI).
504 _aIncludes bibliographical references and index.
505 0 0 _tPhysics of silicon nanodevices /
_rDavid K. Ferry and Richard Akis --
_tTri-gate transistors /
_rSuman Datta --
_tVariability in scaled MOSFETs /
_rToshiro Hiramoto --
_tSelf-heating effects in nanoscale 3D MOSFETs /
_rTsunaki Takahashi and Ken Uchida --
_tSpintronics-based nonvolatile computing systems /
_rTetsuo Endoh --
_tNEMS devices /
_rYoshishige Tsuchiya and Hiroshi Mizuta --
_tTunnel FETs for more energy-efficient computing /
_rAdrian M. Ionescu --
_tDopant-atom silicon tunneling nanodevices /
_rDaniel Moraru and Michiharu Tabe --
_tSingle-electron transfer in Si nanowires /
_rAkira Fujiwara, Gento Yamahata, and Katsuhiko Nishiguchi --
_tCoupled Si quantum dots for spin-based qubits /
_rTetsuo Kodera and Shunri Oda --
_tPotential of nonvolatile magnetoelectric devices for spintronic applications /
_rPeter A. Dowben, Christian Binek, and Dmitri E. Nikonov.
650 0 _aNanoelectromechanical systems.
650 0 _aNanotechnology.
650 0 _aSilicon crystals
_xElectric properties.
700 1 _aOda, Shunri,
_eeditor.
700 1 _aFerry, David K.,
_eeditor.
906 _a7
_bcbc
_ccopycat
_d2
_encip
_f20
_gy-gencatlg
955 _brk15 2016-09-01 z-processor
_irk06 2016-09-06 to BCCD