000			00534nam a2200133Ia 4500
008			2212144s2014 xx 000 0 und d
020			_a9784431547952
041			_aeng
100			_aSeiji Samukawa
245			_aFeature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
260			_aJapan _bSpringer Japan _c2014
650			_aEngineering: Nanotechnology and Microengineering: Nanoscale Science and Technology: Nanotechnology: Plasma Physics: Semiconductors
856			_uhttp://doi.org/10.1007/978-4-431-54795-2
999			_c83798 _d83798